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Metals analysis by ICP-MS is used to measure the presence and quantification of various elements present in a sample. Samples are decomposed to neutral elements in high temperature argon plasma and analyzed based on their mass to charge ratios using a mass spectrometer system.
Most elements can be analyzed at the parts-per-million (PPM) to parts-per-trillion (PPT) concentration levels.
ICP-MS is also capable of monitoring isotopic specification for the ions of choice.
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